Optimization of Atom Flux in Atom Lithography

CHEN Jie1 LIU Jie1 ZHU Li1 DENG Xiao1 CHENG Xinbin1 LI Tongbao1

(1.School of Physics Science and Engineering, Tongji University, Shanghai, China 200092)

【Abstract】Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography. Based on the theoretical model of eruption volume of atomic furnace tube, the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment. Moreover, with the best furnace tube configuration, the peak-to-valley height of the fabricated Cr nano-gratings increases up to 100 nm, which further optimizes the quality of nano-gratings.

【Keywords】 atomic and molecular physics; nanoscale metrology; transfer standards; atom lithography; nano-gratings; atom flux;

【DOI】

【Funds】 National Key Research and Development Program of China (No. 2016YFA0200902) National Key Scientific Instrument and Equipment Development Project of China (No. 2014YQ090709)

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This Article

ISSN:0253-2239

CN: 31-1252/O4

Vol 38, No. 12, Pages 28-32

December 2018

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Article Outline

Abstract

  • 1 Introduction
  • 2 Basic principle and theoretical model
  • 3 Experimental comparison and discussion
  • 4 Conclusions
  • References