Fabrication of Environmentally Adaptive Mid-Infrared Broadband Antireflection Components

ZHANG Hanyu1,2 CUI Yun2,3 SUN Yong2,3,4 ZHANG Yibin2,3 WANG Yonglu2,3 ZHOU Qinling3 SHAO Jianda1,2,3

(1.School of Physical Science and Technology, Shanghai Tech University, Shanghai, China 201210)
(2.Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China 201800)
(3.Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China 201800)
(4.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China 100049)

【Abstract】Infrared broadband antireflection components were successfully fabricated using a microstructure approach combined with a coating method. First, the influence of period, filling factor, height, and film thickness on the required band transmittance was simulated using FDTD Solutions software. As such, the microstructure and film parameters corresponding to good antireflection were obtained. Then, according to these parameters, a parabolic cone microstructure was prepared onto the surface of a sapphire through laser interferometric lithography combined with reactive ion etching technology. Finally, a SiO2 film layer was coated onto the surface of the microstructure. Test results show that the average transmittance of samples with single-sided microstructure and composite structure at 1.5–4 μm were 92.3% and 98.7%, respectively. Therefore, the transmittance increased by 11.0% compared with double-sided polished sapphire samples. Infrared broadband antireflection of the sapphire was obtained. Finally, high-low temperature cycle and humidity experiments were conducted on a sapphire element with composite structure. This experiment shows that the change in transmittance was not obvious and without obvious water absorption, indicating that the component has environmental adaptability.

【Keywords】 optical devices; antireflective microstructure; finite-difference time-domain; interferometric lithography; reactive ion etching;

【DOI】

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(Translated by REN XF)

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This Article

ISSN:0258-7025

CN: 31-1339/TN

Vol 47, No. 03, Pages 56-61

March 2020

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Abstract

  • 1 Introduction
  • 2 Design and simulation of microstructures and composite structures
  • 3 Experimental preparation process
  • 4 Results and discussion
  • 5 Conclusion
  • References